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High energy heavy ion induced enhanced adhesion

Citation

Mendenhall, Marcus H (1983) High energy heavy ion induced enhanced adhesion. Dissertation (Ph.D.), California Institute of Technology. http://resolver.caltech.edu/CaltechTHESIS:11122015-102557568

Abstract

The work described in this thesis represents an attempt to summarize to date the information collected on the process of high energy heavy ion induced enhanced adhesion. Briefly, the process involves the irradiation of materials covered by thin (≾3μm) films with high energy (E > 200 keV I nucleon) heavy ion beams (such as Fluorine or Chlorine). Enhanced adhesion has been observed on all material combinations tested, including metal on metal, metal on semiconductor, metal on dielectric and dielectric on dielectric systems. In some cases, the enhancement can be quite large, so that a film that could be wiped off a substrate quite easily before irradiation can withstand determined scrubbing afterwards.

Very little is understood yet about this adhesion mechanism, so what is presented are primarily observations about systems studied, and descriptions of the actual preparation and irradiation of samples used. Some discussion is presented about mechanisms that have been considered but rejected.

Item Type:Thesis (Dissertation (Ph.D.))
Subject Keywords:Physics
Degree Grantor:California Institute of Technology
Division:Physics, Mathematics and Astronomy
Major Option:Physics
Thesis Availability:Restricted to Caltech community only
Research Advisor(s):
  • Tombrello, Thomas A.
Thesis Committee:
  • Unknown, Unknown
Defense Date:26 April 1983
Record Number:CaltechTHESIS:11122015-102557568
Persistent URL:http://resolver.caltech.edu/CaltechTHESIS:11122015-102557568
Default Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:9275
Collection:CaltechTHESIS
Deposited By: Dan Anguka
Deposited On:12 Nov 2015 22:10
Last Modified:12 Nov 2015 22:10

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