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Interfacial reactions of transition-metal thin films with silicon and aluminum

Citation

Ma, En (1988) Interfacial reactions of transition-metal thin films with silicon and aluminum. Dissertation (Ph.D.), California Institute of Technology. http://resolver.caltech.edu/CaltechTHESIS:11202012-083923501

Abstract

The phenomena of thin-film interdiffusion and intereactions have been a subject of intensive research in recent years. Thin-film reactions involving silicon and aluminum are of particular importance and interest to the metallization schemes in today's integrated circuit technology. This thesis focuses on interfacial reactions induced by conventional furnace annealing, rapid thermal annealing, and ion beam mixing in binary systems of transition-metal/ (Si or Al). Transition metals involved in this study include Ti, Cr, Co, Ni, Mo, Pt, and W.

Analytical techniques utilized are MeV ^4He^+ backscattering spectrometry plus occasional 3.05 MeV^4He^(+ +) O^(16)(α,α)O^(16) resonant scattering, x-ray diffraction, transmission electron microscopy, Auger electron spectroscopy, and scanning electron microscopy.

A broad range of topics essential to the understanding of thin-film reactions have been investigated, among them are the lateral uniformity of the reaction, first growing phase, kinetics, moving species, effects of impurities and microstructure, morphological alterations, amorphous phase formation, and ion-beam- induced atomic mixing.

Relavent factors controlling the evolution of the reactions, such as microstructure, impurity, processing technique, and mechanisms underlying the interdiffusion or atomic mixing processes, are discussed. Examples of manipulating these factors to promote desired reaction processes are presented. Significant progress has been achieved in three major subjects: formation of transition-metal silicides and aluminides, modeling of ion mixing, and amorphization by solid-state interdiffusion reactions.

Item Type:Thesis (Dissertation (Ph.D.))
Subject Keywords:Thin films, electric insulators and insulation, transition metals, silicon-carbide thin films, aluminum films
Degree Grantor:California Institute of Technology
Division:Chemistry and Chemical Engineering
Major Option:Chemistry
Thesis Availability:Restricted to Caltech community only
Research Advisor(s):
  • Nicolet, Marc-Aurele (advisor)
  • Johnson, William Lewis (co-advisor)
Thesis Committee:
  • Unknown, Unknown
Defense Date:December 1988
Record Number:CaltechTHESIS:11202012-083923501
Persistent URL:http://resolver.caltech.edu/CaltechTHESIS:11202012-083923501
Default Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:7276
Collection:CaltechTHESIS
Deposited By: Benjamin Perez
Deposited On:20 Nov 2012 17:22
Last Modified:26 Dec 2012 04:45

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