Photoelectrochemistry of Si/polymer and Si/metal/solution interfaces

Citation

Karp, Christoph D. (1995) Photoelectrochemistry of Si/polymer and Si/metal/solution interfaces. Master's thesis, California Institute of Technology. doi:10.7907/7enk-wj52. https://resolver.caltech.edu/CaltechETD:etd-10262007-085203

Abstract

Part I of this thesis describes the formation of a silicon/polypyrrole junction utilizing a new method of polypyrrole polymerization which was developed in the Lewis Group by Dr. Michael Freund. This new method involves the chemical oxidation of pyrrole to form smooth, conducting polypyrrole films upon solvent evaporation. This polymerization process allows semiconductor/polymer junctions to be formed without exposing the silicon surface to harmful oxidative currents used in electrochemical polymerizations. The studies described herein demonstrate the formation of a stable, rectifying junction between silicon and chemically polymerized polypyrrole.

Part II of this thesis describes work related to a recent hypothesis regarding the charge-transfer processes of metal-coated silicon electrodes in methanol solutions, proposed by Ming Tan of the Lewis Group. The silicon is modified by depositing thin metal lines onto the surface, which facilitate electron-transfer between the silicon and the solution and limit direct charge transfer through the silicon/solution interface. The design of these devices allows examination of the interaction of semiconductor/metal and semiconductor/liquid junction characteristics as a function of the size and distribution of metal lines.

Thesis Files